John Daugherty
74Patents
16h-index
101Co-inventors
87Inventor score
Filing activity: Dec 29, 1997 → Jun 6, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6537429B2 | Diamond coatings on reactor wall and method of manufacturing thereof | Emerging Cross-Sectional Technologies | 58 | Expired |
| US6344105B1 | Techniques for improving etch rate uniformity | Emerging Cross-Sectional Technologies | 55 | Expired |
| US8292698B1 | On-line chamber cleaning using dry ice blasting | Electricity | 49 | Active |
| US6830622B2 | Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof | Emerging Cross-Sectional Technologies | 49 | Expired |
| US7300537B2 | Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor | Electricity | 46 | Expired |
| US7138067B2 | Methods and apparatus for tuning a set of plasma processing steps | Electricity | 36 | Expired |
| US6613442B2 | Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof | Chemistry; Metallurgy | 32 | Expired |
| US7311797B2 | Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor | Electricity | 31 | Expired |
| US6620520B2 | Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof | Emerging Cross-Sectional Technologies | 30 | Expired |
| US6533910B2 | Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof | Performing Operations; Transporting | 30 | Expired |
| US6016766A | Microwave plasma processor | Electricity | 27 | Expired |
| US7255898B2 | Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof | Emerging Cross-Sectional Technologies | 19 | Expired |
| US9972478B2 | Method and process of implementing machine learning in complex multivariate wafer processing equipment | Electricity | 18 | Active |
| US6776851B1 | In-situ cleaning of a polymer coated plasma processing chamber | Emerging Cross-Sectional Technologies | 17 | Expired |
| US7250114B2 | Methods of finishing quartz glass surfaces and components made by the methods | Emerging Cross-Sectional Technologies | 17 | Expired |
| US9873940B2 | Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus | Emerging Cross-Sectional Technologies | 16 | Active |
| US6773751B2 | Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof | Chemistry; Metallurgy | 15 | Expired |
| US7234222B1 | Methods and apparatus for optimizing the delivery of a set of gases in a plasma processing system | Emerging Cross-Sectional Technologies | 12 | Expired |
| US7685965B1 | Apparatus for shielding process chamber port | Electricity | 9 | Expired |
| US9502275B1 | Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs | Electricity | 8 | Active |
| US7402258B2 | Methods of removing metal contaminants from a component for a plasma processing apparatus | Emerging Cross-Sectional Technologies | 8 | Active |
| US9314854B2 | Ductile mode drilling methods for brittle components of plasma processing apparatuses | Emerging Cross-Sectional Technologies | 8 | Active |
| US6821378B1 | Pump baffle and screen to improve etch uniformity | Electricity | 7 | Expired |
| US10615009B2 | System implementing machine learning in complex multivariate wafer processing equipment | Electricity | 7 | Active |
| US9123651B2 | Dense oxide coated component of a plasma processing chamber and method of manufacture thereof | Emerging Cross-Sectional Technologies | 6 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.