Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy
US7234862B2 · kind B2 · utility
8Cited by
37References
46Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 12, 2001 |
| Grant date | Jun 26, 2007 |
| Priority date | — |
| Expiry date | Oct 12, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01K11/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus (295) using specular reflection spectroscopy to measure a temperature of a substrate (135). By reflecting light (100) from a substrate, the temperature of the substrate can be determined using the band-edge characteristics of the substrate. This in situ apparatus can be used as a feedback control in combination with a variable temperature substrate holder to more accurately control the processing conditions of the substrate. By utilizing a multiplicity of measurement sites, the variation of the temperature across the substrate can also be measured.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.