System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold
US7240679B2 · kind B2 · utility
6Cited by
46References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 24, 2002 |
| Grant date | Jul 10, 2007 |
| Priority date | — |
| Expiry date | Feb 8, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
One of many embodiments of a substrate preparation system is provided which includes a drying system, the drying system including at least one proximity head for drying a substrate. The system also includes a cleaning system for cleaning the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.