Basic quencher/developer solutions for photoresists
US7241560B2 · kind B2 · utility
3Cited by
2References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 1, 2005 |
| Grant date | Jul 10, 2007 |
| Priority date | — |
| Expiry date | Jun 1, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/327
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A basic developer/quencher solution formulated to include at least one supercritical fluid or liquid solvent and a base may be used to quench a photo-generated acid within a photoresist as well as develop the photoresist. The supercritical fluid or liquid solvent may be carbon dioxide and the base may be quaternary ammonium salt that has side groups that increase the solubility of the quaternary ammonium salt in carbon dioxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.