Ernisse Putna
9Patents
3h-index
16Co-inventors
50Inventor score
Filing activity: Oct 16, 2003 → Apr 5, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7678527B2 | Methods and compositions for providing photoresist with improved properties for contacting liquids | Physics | 9 | Expired |
| US7241560B2 | Basic quencher/developer solutions for photoresists | Physics | 3 | Expired |
| US7147985B2 | Resist compounds including acid labile groups having hydrophilic groups attached thereto | Emerging Cross-Sectional Technologies | 3 | Expired |
| US7391501B2 | Immersion liquids with siloxane polymer for immersion lithography | Physics | 1 | Expired |
| US7507521B2 | Silicon based optically degraded arc for lithographic patterning | Electricity | 1 | Expired |
| US10459338B2 | Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging | Performing Operations; Transporting | 1 | Active |
| US7687225B2 | Optical coatings | Emerging Cross-Sectional Technologies | 0 | Active |
| US9625815B2 | Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging | Performing Operations; Transporting | 0 | Active |
| US7361455B2 | Anti-reflective coatings | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.