Lithographic apparatus and device manufacturing method
US7248339B2 · kind B2 · utility
4Cited by
8References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 1, 2004 |
| Grant date | Jul 24, 2007 |
| Priority date | — |
| Expiry date | Sep 18, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.