Patent · US Expired

Method for adjusting a substrate in an appliance for carrying out exposure

US7248365B2 · kind B2 · utility

1Cited by

7References

2Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Thorsten Schedel · Dresden, DE
Martin Rössiger · Dresden, DE

Key dates

Filing date	Nov 19, 2003
Grant date	Jul 24, 2007
Priority date	—
Expiry date	Jul 14, 2024

Classification

Technology area (CPC G)Physics
CPC primaryG03B27/32
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The unevennesses of a chuck are measured at various positions and are stored, as discrepancies from an idealized plane, in a databank. The measured discrepancies are used to calculate corrections for the predetermined settings for the focus distance and/or the tilt of the chuck. These corrections are in each case used differently for adjusting the respective exposure of the exposure areas.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.