Charge-control pre-scanning for e-beam imaging
US7253410B1 · kind B1 · utility
27Cited by
18References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 13, 2005 |
| Grant date | Aug 7, 2007 |
| Priority date | — |
| Expiry date | Dec 6, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
One embodiment described relates to a method of electron beam imaging of a target area of a substrate. An electron beam column is configured for charge-control pre-scanning using a primary electron beam. A pre-scan is performed over the target area. The electron beam column is re-configured for imaging using the primary electron beam. An imaging scan is then performed over the target area. Other embodiments are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.