Detection of defects in patterned substrates
US7253645B2 · kind B2 · utility
72Cited by
2References
2Claims
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Assignee
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Key dates
| Filing date | Feb 28, 2005 |
| Grant date | Aug 7, 2007 |
| Priority date | — |
| Expiry date | Feb 28, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of detecting defects in a patterned substrate includes positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle-beam optical column having a field of view (FOV) with a substantially uniform resolution over the FOV; operating the charged-particle-beam optical column to acquire images of a region of the patterned substrate lying within the FOV by scanning the charged-particle beam over the patterned substrate; and comparing the acquired images to a reference to identify defects in the patterned substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.