Metrology system with spectroscopic ellipsometer and photoacoustic measurements
US7253887B2 · kind B2 · utility
1Cited by
19References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 30, 2006 |
| Grant date | Aug 7, 2007 |
| Priority date | — |
| Expiry date | Jan 30, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/1725
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A photoacoustic system with ellipsometer, where the ellipsometer includes a laser light source for generating an incident beam, an element for focusing the incident beam on a sample, a unit for measuring the change in amplitude of the incident beam on reflection and a unit for measuring the phase difference of the incident beam on reflection. The system further includes an element to convert an input narrow spectrum beam generated by the laser light source to a broadband sample measurement beam that is focused onto the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.