Patent · US Expired

Method of cutting integrated circuit chips from wafer by ablating with laser and cutting with saw blade

US7265034B2 · kind B2 · utility

19Cited by
14References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 5, 2005
Grant dateSep 4, 2007
Priority date
Expiry dateJan 2, 2026

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/00014
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method of cutting an integrated circuit chip from a wafer having a plurality of integrated circuit chips is provided. An upper portion of the wafer is ablated using two laser beams to form two substantially parallel trenches that extend into the wafer from a top surface of the wafer through intermetal dielectric layers and at least partially into a substrate of the wafer. After the ablating to form the two trenches, cutting through the wafer between outer sidewalls of the two laser-ablated trenches with a saw blade is performed. A width between the outer sidewalls of the two laser-ablated trenches is greater than a cutting width of the saw blade. This may be particularly useful in lead-free packaging applications and/or applications where the intermetal dielectric layers use low-k dielectric materials, for example.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.