Methods for removing silicon and silicon-nitride contamination layers from deposition tubes
US7267132B2 · kind B2 · utility
0Cited by
4References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 9, 2005 |
| Grant date | Sep 11, 2007 |
| Priority date | — |
| Expiry date | Feb 9, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/905
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Described are methods, systems, and chemistries for removing layers of stubborn silicon and silicon-nitride contamination layers from the inside surfaces of such articles as deposition tubes. In such embodiments, a tube to be cleaned is gently rolled on it side while a portion the tube's interior surface is exposed to an etchant. The tube is only partially filled with etchant to reduce the requisite etchant volume, and the rolling motion evenly exposes the contaminated inner surface to the etchant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.