Method and apparatus for measuring dimension using electron microscope
US7269287B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 3, 2006 |
| Grant date | Sep 11, 2007 |
| Priority date | — |
| Expiry date | Jan 3, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Disclosed is a scanning electron microscope (SEM) for realizing high-precision dimension measurement of a sample, such as an ArF exposure photoresist, that requires the measurement of a dimension by a low S/N signal waveform. To this end, partial waveforms (or partial images) of sample signal waveforms (or an images) acquired from a dimension measurement target sample and a sample material of the same kind are registered in advance, a measurement target signal waveform (or an image) obtained from the dimension measurement target sample and the sample registration waveform are combined, and a dimension of the dimension measurement target pattern is calculated based on the combination result.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.