Inspection method and inspection apparatus using electron beam
US7271385B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 26, 2005 |
| Grant date | Sep 18, 2007 |
| Priority date | — |
| Expiry date | Nov 3, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An inspection method and an inspection apparatus using an electron beam enabling more detailed and quantitative evaluation at a high throughput level. The method comprises the steps of irradiating, based on previously prepared information concerning a defect position on the surface of a sample, the defect and its vicinity with an electron beam a plurality of times at predetermined intervals; detecting an electron signal secondarily generated from the sample surface by the electron beam; imaging an electron signal detected by the previously specified n-th or later electron beam irradiation; and measuring the resistance or a leakage amount of the defective portion of the sample surface in accordance with the degree of charge relaxation by monitoring the charge relaxation state of the sample surface based on the electron beam image information.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.