Ryuichi Funatsu
18Patents
11h-index
34Co-inventors
72Inventor score
Filing activity: Apr 16, 1986 → Feb 22, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7880143B2 | Electron beam apparatus | Electricity | 37 | Active |
| US5125740A | Method and apparatus for measuring optical constants of a thin film as well as method and apparatus for fabricating a thin film utilizing same | Physics | 35 | Expired |
| US4666291A | Light-exposure apparatus | Physics | 27 | Expired |
| US4852133A | X-ray lithography apparatus | Physics | 26 | Expired |
| US5008702A | Exposure method and apparatus | Physics | 23 | Expired |
| US4777641A | Method and apparatus for alignment | Physics | 22 | Expired |
| US5121449A | Information detecting system of scanning type | Physics | 21 | Expired |
| US7034298B2 | Inspection method and apparatus using an electron beam | Electricity | 19 | Expired |
| US6566654B1 | Inspection of circuit patterns for defects and analysis of defects using a charged particle beam | Electricity | 16 | Expired |
| US5134298A | Beam control method and apparatus | Electricity | 14 | Expired |
| US7071468B2 | Circuit pattern inspection method and its apparatus | Electricity | 11 | Expired |
| US5195070A | Optical information processing apparatus and optical pickup therefor | Physics | 11 | Expired |
| US7425704B2 | Inspection method and apparatus using an electron beam | Electricity | 9 | Active |
| US7906761B2 | Charged particle beam apparatus | Electricity | 8 | Active |
| US8193493B2 | Charged particle beam apparatus | Electricity | 3 | Active |
| US7081625B2 | Charged particle beam apparatus | Electricity | 2 | Expired |
| US7271385B2 | Inspection method and inspection apparatus using electron beam | Electricity | 2 | Expired |
| US7855363B2 | Inspection method and apparatus using an electron beam | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.