Resolution enhanced optical metrology
US7274472B2 · kind B2 · utility
14Cited by
8References
45Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 28, 2003 |
| Grant date | Sep 25, 2007 |
| Priority date | — |
| Expiry date | Jun 20, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/303
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A resolution enhanced optical metrology system to examine a structure formed on a semiconductor wafer includes a source configured to direct an incident beam at the structure through a coupling element. The coupling element is disposed between the source and the structure with a gap having a gap height defined between the coupling element and the structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.