Inventor · Ilmenau, DE

Joerg Bischoff

24Patents
9h-index
15Co-inventors
68Inventor score

Filing activity: Jan 31, 2002 → Feb 10, 2012

Most-cited inventions

PatentTitleAreaCited byStatus
US6772084B2 Overlay measurements using periodic gratings Physics 115 Expired
US7224471B2 Azimuthal scanning of a structure formed on a semiconductor wafer Physics 27 Expired
US6804005B2 Overlay measurements using zero-order cross polarization measurements Physics 26 Expired
US6775015B2 Optical metrology of single features Physics 24 Expired
US7046375B2 Edge roughness measurement in optical metrology Physics 23 Expired
US6947141B2 Overlay measurements using zero-order cross polarization measurements Physics 18 Expired
US7388677B2 Optical metrology optimization for repetitive structures Physics 16 Expired
US7274472B2 Resolution enhanced optical metrology Physics 14 Expired
US7949618B2 Training a machine learning system to determine photoresist parameters Physics 9 Active
US7030999B2 Optical metrology of single features Physics 6 Expired
US7567353B2 Automated process control using optical metrology and photoresist parameters Physics 5 Active
US7630873B2 Approximating eigensolutions for use in determining the profile of a structure formed on a semiconductor wafer Physics 4 Active
US7414733B2 Azimuthal scanning of a structure formed on a semiconductor wafer Physics 4 Active
US7379192B2 Optical metrology of single features Physics 4 Active
US7616325B2 Optical metrology optimization for repetitive structures Physics 2 Active
US7586623B2 Optical metrology of single features Physics 2 Active
US7728976B2 Determining photoresist parameters using optical metrology Physics 2 Active
US7427521B2 Generating simulated diffraction signals for two-dimensional structures Physics 2 Expired
US8195435B2 Hybrid diffraction modeling of diffracting structures Physics 2 Active
US9625937B2 Computation efficiency by diffraction order truncation Physics 1 Active
US8762100B1 Numerical aperture integration for optical critical dimension (OCD) metrology Physics 1 Active
US7274465B2 Optical metrology of a structure formed on a semiconductor wafer using optical pulses Electricity 1 Expired
US7598099B2 Method of controlling a fabrication process using an iso-dense bias Electricity 1 Active
US7639370B2 Apparatus for deriving an iso-dense bias Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.