Radiation patterning tools, and methods of forming radiation patterning tools
US7291425B2 · kind B2 · utility
4Cited by
11References
47Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 1, 2004 |
| Grant date | Nov 6, 2007 |
| Priority date | — |
| Expiry date | Feb 18, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention includes, for example, a radiation patterning tool which can be utilized to form relatively circular contacts in situations in which an array of contacts has a different pitch along a row of the array than along a column of the array. An alternating phase shift can give a well-defined contact in the small pitch (dense) direction. Rim shifters are added in the larger pitch direction to force the circular form of the contact openings. In further aspects of the invention, side-lobe-suppressing patterns can be added between adjacent rims. The invention also includes methods of forming radiation patterning tools.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.