Optical measurements of patterned structures
US7292335B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 4, 2003 |
| Grant date | Nov 6, 2007 |
| Priority date | — |
| Expiry date | Mar 30, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/306
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and a system for optical measuring in a structure having a pattern in the form of spaced-apart parallel elongated regions of optical properties different from that of spaces between said regions. The system comprises a broadband illuminator (8) for generating incident radiation, a spectrophotometer arrangement (30) for detecting a spectral response of the structure to the incident radiation, and an optical arrangement (2) for directing the incident light to the structure and collecting the response of the structure, said optical arrangement (2) comprising a numerical aperture (32) selectively limiting the range of at least one of light incidence or collecting angles in direction substantially perpendicular to longitudinal axes of said elongated regions of the pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.