Patent · US Expired

Method and apparatus for sample formation and microanalysis in a vacuum chamber

US7297965B2 · kind B2 · utility

21Cited by
6References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 28, 2005
Grant dateNov 20, 2007
Priority date
Expiry dateJul 28, 2025

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/31749
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Methods and apparatus are disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron transparency analysis in a vacuum chamber. In some embodiments, a method is provided for imaging an object cross section surface of an extracted sample. Optionally, the sample is iteratively thinned and imaged within the vacuum chamber. In some embodiments, the sample is situated on a sample support including an optional aperture. Optionally, the sample is situated on a surface of the sample support such that the object cross section surface is substantially parallel to the surface of the sample support. Once mounted on the sample support, the sample is either subjected to microanalysis in the vacuum chamber, or loaded onto a loading station. In some embodiments, the sample is imaged with an electron beam substantially normally incident to the object cross section surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.