Lithographic apparatus and device manufacturing method
US7298455B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 17, 2005 |
| Grant date | Nov 20, 2007 |
| Priority date | — |
| Expiry date | May 10, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70066
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a lithographic apparatus, including: a substrate table constructed to hold a substrate; a projection system configured to project a radiation beam through an exposure slit area onto a target portion of the substrate; a patterning device configured to import the radiation beam with a pattern in its cross-section to form a patterned radiation beam, the patterned radiation beam at the target portion of the substrate being in focus over a depth of focus; and a measurement system that is arranged to measure a surface topography of at least part of the target portion, wherein the projection system is arranged to adjust a dimension of the exposure slit area to form an adjusted exposure slit area over which surface topography variations are equal to or smaller than the depth of focus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.