Method and apparatus to help promote contact of gas with vaporized material
US7300038B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 1, 2004 |
| Grant date | Nov 27, 2007 |
| Priority date | — |
| Expiry date | Jun 1, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S261/65
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Structure helps support material in a container with an increased exposed surface area to help promote contact of a gas with vaporized material. For at least one disclosed embodiment, the structure may help support material for vaporization in the same form as when the material is placed at the structure. For at least one disclosed embodiment, the structure may help support material with an increased exposed surface area relative to a maximum exposed surface area the material could have at rest in the container absent the structure. For at least one disclosed embodiment, the structure may define one or more material support surfaces in an interior region of the container in addition to a bottom surface of the interior region of the container. For at least one disclosed embodiment, the structure may define in an interior region of the container one or more material support surfaces having a total surface area greater than a surface area of a bottom surface of the interior region of the container. For at least one disclosed embodiment, gas resulting from contact of received gas with vaporized material may be delivered to atomic layer deposition (ALD) process equipment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.