Method for dynamically monitoring a reticle

US7304721B2 · kind B2 · utility

Assignee

• Infineon Technologies AG · DE

Inventors

• Henning Haffner · Pawling, US
• Karin Eggers · Dresden, DE
• Norbert Haase · Dresden, DE
• Andreas Frangen · Dresden, DE
• Carmen Jaehnert · Dresden, DE

Key dates

• Filing date: Nov 10, 2004
• Grant date: Dec 4, 2007
• Expiry date: Dec 10, 2025

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N2021/95676
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

The method of dynamically monitoring a reticle includes preventively macro monitoring and defect inspecting with regard to mechanical loading, including particle deposits or electrostatically induced damage, and energy load, including the associated changes to the reticle material and surface characteristics. Different surface distributions of the absorber layer as well as characteristics of the exposure system, such as N2 purging of the projection lens/reticle area in order to reduce contamination and recrystallization on optically active surfaces are considered.