Methods and systems for process monitoring using x-ray emission
US7312446B2 · kind B2 · utility
1Cited by
4References
60Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 8, 2003 |
| Grant date | Dec 25, 2007 |
| Priority date | — |
| Expiry date | Jul 3, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/2252
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions. Concept as expressed herein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.