Patent · US Expired

Polarized radiation in lithographic apparatus and device manufacturing method

US7312852B2 · kind B2 · utility

2Cited by

5References

29Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Christian Wagner · Rosenheim, DE
Wilhelmus Petrus De Boeij · Veldhoven, NL
Tilmann Heil · Aalen, DE
Damian Fiolka · Oberkochen, DE

Key dates

Filing date	Dec 28, 2004
Grant date	Dec 25, 2007
Priority date	—
Expiry date	Oct 20, 2025

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70191
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithographic apparatus uses polarized light to improve the imaging properties, such as exposure latitude, while maintaining and extending the lifetime of an illumination system in the lithographic apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.