Tilmann Heil
6Patents
3h-index
20Co-inventors
49Inventor score
Filing activity: Dec 28, 2004 → Feb 4, 2010
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7345740B2 | Polarized radiation in lithographic apparatus and device manufacturing method | Physics | 59 | Expired |
| US8325322B2 | Optical correction device | Physics | 11 | Active |
| US7800732B2 | Projection exposure method and projection exposure apparatus for microlithography | Physics | 7 | Active |
| US7312852B2 | Polarized radiation in lithographic apparatus and device manufacturing method | Physics | 2 | Expired |
| US7999916B2 | Microlithographic projection exposure apparatus | Physics | 1 | Active |
| US7929116B2 | Polarized radiation in lithographic apparatus and device manufacturing method | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.