Lithographic apparatus and device manufacturing method
US7317507B2 · kind B2 · utility
28Cited by
16References
24Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 3, 2005 |
| Grant date | Jan 8, 2008 |
| Priority date | — |
| Expiry date | May 24, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus uses a volume of a second liquid to confine a first liquid to a space between the projection system and the substrate. In an embodiment, the first and second liquids are substantially immiscible and may be a cycloalkane, such as cyclooctane, decalin, bicyclohexyl, exo-tetrahydro-dicyclopentadiene and cyclohexane, another high-index hydrocarbon, a perfluoropolyether, such as perfluoro-N-methylmorpholine and perfluoro E2, a perfluoroalkane, such as perfluorohexane, or a hydrofluoroether; and water, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.