Vacuum processing apparatus
US7322561B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 2, 2005 |
| Grant date | Jan 29, 2008 |
| Priority date | — |
| Expiry date | Apr 28, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6719
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The invention provides a highly reliable plasma processing apparatus having stable sealing performance. The vacuum processing apparatus comprises a vacuum vessel 509 having its inside decompressed, an opening 1201 disposed on a wall of the vacuum vessel for communicating the inside with the outside and through which a sample to be processed is taken in and out, a valve body 1001 disposed outside the wall for airtightly sealing or opening the opening 1201, a seal member 1002 disposed on the side of the valve body that comes into contact with the wall surrounding the opening for sealing the inside of the opening by being in contact with the wall and the valve body 1001 when the valve body seals the opening 1201, a first projection having a projected curved surface that comes into contact with the wall, and an overhang extending from this projection which is engaged with and attached to the inside of the valve body 1001, which constitute the seal member, and a cover 1003 disposed on the side of the valve body 1001 that comes into contact with the wall for pressing at least a portion of the overhang onto the valve body and determining the position thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.