Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition
US7323581B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 28, 2000 |
| Grant date | Jan 29, 2008 |
| Priority date | — |
| Expiry date | Aug 28, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/408
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A metalorganic complex composition comprising a metalorganic complex selected from the group consisting of: metalorganic complexes comprising one or more metal central atoms coordinated to one or more monodentate or multidentate organic ligands, and complexed with one or more complexing monodentate or multidentate ligands containing one or more atoms independently selected from the group consisting of atoms of the elements C, N, H, S, O and F; wherein when the number of metal atoms is one and concurrently the number of complexing monodentate or multidentate ligands is one, then the complexing monodentate or multidentate ligand of the metalorganic complex is selected from the group consisting of beta-ketoiminates, beta-diiminates, C2-C10 alkenyl, C2-C15 cycloalkenyl and C6-C10 aryl.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.