Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus
US7325511B2 · kind B2 · utility
8Cited by
10References
29Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Oct 18, 2002 |
| Grant date | Feb 5, 2008 |
| Priority date | — |
| Expiry date | Jul 6, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32192
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A microwave plasma processing apparatus includes a processing vessel, a microwave generator, a waveguide guiding a microwave formed by the microwave generator, and a microwave emitting member emitting the microwave with wavelength compression by a retardation plate, wherein the waveguide has a single microwave output opening in a location corresponding to a central par of the microwave emitting member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.