Patent · US Expired

High throughput multi beam system and method

US7326901B2 · kind B2 · utility

0Cited by
4References
2Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 2, 2004
Grant dateFeb 5, 2008
Priority date
Expiry dateJul 13, 2025

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N21/8806
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A system and method for inspecting an article, the system includes a spatial filter that is shaped such as to direct output beams towards predefined locations and an optical beam directing entity, for directing the multiple output beams toward multiple detector arrays. The method includes spatially filtering multiple input light beams to provide substantially aberration free output light beams; and directing the multiple output beams by an optical beam directing entity, toward multiple detector arrays.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.