Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
US7327435B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 27, 2005 |
| Grant date | Feb 5, 2008 |
| Priority date | — |
| Expiry date | Oct 27, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70733
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.