Apparatus and method for inspecting defects
US7333192B2 · kind B2 · utility
26Cited by
7References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 16, 2007 |
| Grant date | Feb 19, 2008 |
| Priority date | — |
| Expiry date | Jan 16, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/95638
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A defect inspection apparatus includes an irradiation optical system 20, a detection optical system 30, and an image processor 40. In the irradiation optical system, a mirror 2603 is disposed to reflect downward a beam flux that has been guided to a first or second optical path, and a cylindrical lens 251 and an inclined mirror 2604 are disposed to focus the beam flux that has been directed downward by the mirror, at an inclination angle from a required oblique direction extending horizontally, onto a substrate 1 to be inspected, as a slit-shaped beam 90.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.