Apparatus and methods for the detection of an arc in a plasma processing system
US7334477B1 · kind B1 · utility
27Cited by
2References
26Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 22, 2004 |
| Grant date | Feb 26, 2008 |
| Priority date | — |
| Expiry date | Jan 3, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0206
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a plasma processing system, a method for detecting an arc event on a substrate in a plasma chamber having a chuck is disclosed. The method includes positioning a substrate on the chuck. The method also includes providing a vibration-sensing arrangement in the plasma chamber, the vibration-sensing arrangement being configured for measuring arc-induced vibrations on the substrate, the arc-induced vibrations being generated when an arc strikes the substrate during plasma processing of the substrate in the plasma processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.