System and method for sample charge control
US7335879B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 12, 2005 |
| Grant date | Feb 26, 2008 |
| Priority date | — |
| Expiry date | Aug 4, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system and method for characterizing and charging a sample. The system includes a vacuum chamber, a first apparatus in the vacuum chamber and configured to characterize a sample, and a second apparatus in the vacuum chamber and configured to charge the sample. The second apparatus includes an electron gun configured to provide an electron beam to the sample and including an emission cathode biased to a first voltage relative to a reference voltage, a sample holder configured to support the sample, and a mesh located between the electron gun and the sample holder. Additionally, the second apparatus includes a first voltage supply configured to bias the mesh to a second voltage relative to the sample holder, and a second voltage supply configured to bias the sample holder to a third voltage relative to the reference voltage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.