Charged particle beam apparatus
US7339167B2 · kind B2 · utility
17Cited by
11References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 4, 2005 |
| Grant date | Mar 4, 2008 |
| Priority date | — |
| Expiry date | Aug 11, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31749
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged particle beam apparatus in which an electrostatic lens is used as a main focusing element to obtain a subminiature high-sensitivity high-resolution SEM, a drift tube for an electron beam is located inside a column between an electron source and a sample, and a detector for secondary electrons is located inside the drift tube. This solves the problem associated with the provision of a secondary electron detector, which heretofore has been a bottleneck in making a subminiature high-resolution SEM column.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.