Immersion lithography fluid control system that applies force to confine the immersion liquid
US7339650B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 29, 2005 |
| Grant date | Mar 4, 2008 |
| Priority date | — |
| Expiry date | Sep 29, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70808
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A fluid control system for immersion lithography that uses an optical member such as a lens, a workpiece such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, includes a fluid-supplying device for providing an immersion fluid such as water to a specified exposure area in the gap, and a fluid control device that activates a force on the fluid so that the immersion fluid is retained in the exposure area and its vicinity at least while the immersion lithography operation is being carried out. A pressured gas may be caused to apply a hydrodynamic force on the fluid to keep it in its place.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.