Inventor · Redwood City, CA, US

Derek Coon

23Patents
9h-index
10Co-inventors
68Inventor score

Filing activity: Mar 10, 2003 → Apr 25, 2014

Most-cited inventions

PatentTitleAreaCited byStatus
US8237911B2 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine Physics 34 Active
US8068209B2 Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool Physics 34 Active
US7339650B2 Immersion lithography fluid control system that applies force to confine the immersion liquid Physics 33 Expired
US8289497B2 Apparatus and methods for recovering fluid in immersion lithography Physics 33 Active
US8934080B2 Apparatus and methods for recovering fluid in immersion lithography Physics 32 Active
US8400610B2 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine Physics 32 Active
US8743343B2 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine Physics 31 Active
US8610873B2 Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate Physics 24 Active
US7576833B2 Gas curtain type immersion lithography tool using porous material for fluid removal Physics 14 Active
US7745079B2 Apparatus for and method of thermophoretic protection of an object in a high-vacuum environment Physics 8 Active
US8497973B2 Immersion lithography fluid control system regulating gas velocity based on contact angle Physics 7 Active
US7532309B2 Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid Physics 6 Active
US7591561B2 Liquid cooled mirror for use in extreme ultraviolet lithography Physics 4 Active
US9329492B2 Apparatus and method to control vacuum at porous material using multiple porous materials Physics 2 Active
US9176394B2 Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate Physics 2 Active
US8477284B2 Apparatus and method to control vacuum at porous material using multiple porous materials Physics 2 Active
US8102501B2 Immersion lithography fluid control system using an electric or magnetic field generator Physics 1 Active
US6847431B2 Method and device for controlling fluid flow in an optical assembly Physics 1 Expired
US8797500B2 Immersion lithography fluid control system changing flow velocity of gas outlets based on motion of a surface Physics 1 Active
US7903233B2 Offset partial ring seal in immersion lithographic system Physics 1 Expired
US9217933B2 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine Physics 0 Active
US8634055B2 Apparatus and method to control vacuum at porous material using multiple porous materials Physics 0 Active
US9618852B2 Immersion lithography fluid control system regulating flow velocity of gas based on position of gas outlets Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.