System for a pellicle frame with heightened bonding surfaces
US7339653B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 6, 2007 |
| Grant date | Mar 4, 2008 |
| Priority date | — |
| Expiry date | Feb 6, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/64
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.