Dark field inspection system
US7339661B2 · kind B2 · utility
16Cited by
12References
65Claims
0Family size
Inventors
Key dates
| Filing date | Sep 8, 2003 |
| Grant date | Mar 4, 2008 |
| Priority date | — |
| Expiry date | Sep 2, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/005
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Apparatus for inspection of a sample includes a radiation source, which is adapted to direct optical radiation onto an area of a surface of the sample, and a plurality of image sensors. Each of the image sensors is configured to receive the radiation scattered from the area into a different, respective angular range, so as to form respective images of the area. An image processor is adapted to process at least one of the respective images so as to detect a defect on the surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.