Haim Feldman
44Patents
7h-index
44Co-inventors
69Inventor score
Filing activity: Dec 24, 1998 → Sep 2, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6124924A | Focus error correction method and apparatus | Physics | 50 | Expired |
| US7630069B2 | Illumination system for optical inspection | Electricity | 18 | Active |
| US7339661B2 | Dark field inspection system | Electricity | 16 | Expired |
| US6809808B2 | Wafer defect detection system with traveling lens multi-beam scanner | Physics | 13 | Expired |
| US7030978B2 | System and method for inspection of a substrate that has a refractive index | Physics | 10 | Expired |
| US7053395B2 | Wafer defect detection system with traveling lens multi-beam scanner | Physics | 8 | Expired |
| US7331033B2 | Simulation of aerial images | Physics | 7 | Expired |
| US7187439B2 | High throughput inspection system and method for generating transmitted and/or reflected images | Physics | 7 | Expired |
| US7002695B2 | Dual-spot phase-sensitive detection | Electricity | 7 | Expired |
| US6853475B2 | Wafer defect detection system with traveling lens multi-beam scanner | Physics | 6 | Expired |
| US7684048B2 | Scanning microscopy | Physics | 6 | Active |
| US10386311B1 | System and method for defect detection using multi-spot scanning | Physics | 6 | Active |
| US6943898B2 | Apparatus and method for dual spot inspection of repetitive patterns | Physics | 6 | Expired |
| US9810643B1 | System and method for defect detection using multi-spot scanning | Physics | 5 | Active |
| US9535014B1 | Systems and methods for inspecting an object | Physics | 4 | Active |
| US6930770B2 | High throughput inspection system and method for generating transmitted and/or reflected images | Physics | 4 | Expired |
| US6937343B2 | Laser scanner with amplitude and phase detection | Physics | 3 | Expired |
| US7924419B2 | Illumination system for optical inspection | Electricity | 3 | Active |
| US6671098B2 | Scanning angle expander and a method for expanding a scanning beam angle | Physics | 2 | Expired |
| US7973919B2 | High resolution wafer inspection system | Physics | 2 | Active |
| US8228601B2 | Scanning microscopy using inhomogeneous polarization | Physics | 2 | Active |
| US8488117B2 | Inspection system and method for fast changes of focus | Physics | 2 | Active |
| US6750436B2 | Focus error detection apparatus and method having dual focus error detection path | Physics | 2 | Expired |
| US7053985B2 | Printer and a method for recording a multi-level image | Physics | 1 | Expired |
| US7342218B2 | Methods and systems for optical inspection of surfaces based on laser screening | Physics | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.