Clustered surface preparation for silicide and metal contacts
US7344983B2 · kind B2 · utility
3Cited by
6References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 18, 2005 |
| Grant date | Mar 18, 2008 |
| Priority date | — |
| Expiry date | Sep 17, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67745
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A cluster tool is provided for the implementing of a clustered and integrated surface pre-cleaning of the surface of semiconductor devices. More particularly, there is provided a cluster tool and a method of utilization thereof in an integrated semiconductor device surface pre-cleaning, which is directed towards a manufacturing aspect in which a chamber for performing a dry processing chemical oxide removal (COR) on the semiconductor device surface is clustered with other tools, such as a metal deposition tool for silicide or contact formation, including the provision of a vacuum transfer module in the cluster tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.