Patent · US Expired

Polarized radiation in lithographic apparatus and device manufacturing method

US7345740B2 · kind B2 · utility

59Cited by

5References

25Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Christian Wagner · Rosenheim, DE
Wilhelmus Petrus De Boeij · Veldhoven, NL
Roel De Jonge · Veldhoven, NL
Tilmann Heil · Aalen, DE
Damian Fiolka · Oberkochen, DE

Key dates

Filing date	Apr 8, 2005
Grant date	Mar 18, 2008
Priority date	—
Expiry date	Sep 22, 2025

Classification

Technology area (CPC G)Physics
CPC primaryG03F9/7065
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.