Illumination system particularly for microlithography

US7348565B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Hans-Juergen Mann · Oberkochen, DE
• Wolfgang Singer · Aalen, DE
• Joerg Schultz · Aalen, DE
• Johannes Wangler · Oberkochen, DE
• Karl-Heinz Schuster · Oberkochen, DE
• Udo Dinger · Oberkochen, DE
• Martin Antoni · Aalen, DE
• Wilhelm Ulrich · Aalen, DE

Key dates

• Filing date: Jan 3, 2007
• Grant date: Mar 25, 2008
• Expiry date: Jan 3, 2027

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K2201/061
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element is situated in or near a plane defined by the real entrance pupil.