Joerg Schultz
7Patents
4h-index
18Co-inventors
46Inventor score
Filing activity: Jul 14, 2004 → Aug 25, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7511886B2 | Optical beam transformation system and illumination system comprising an optical beam transformation system | Physics | 56 | Expired |
| US7186983B2 | Illumination system particularly for microlithography | Physics | 9 | Expired |
| US7977651B2 | Illumination system particularly for microlithography | Physics | 4 | Active |
| US7348565B2 | Illumination system particularly for microlithography | Physics | 4 | Active |
| US7456408B2 | Illumination system particularly for microlithography | Physics | 3 | Active |
| US7592598B2 | Illumination system particularly for microlithography | Physics | 1 | Active |
| US7551361B2 | Lithography lens system and projection exposure system provided with at least one lithography lens system of this type | Physics | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.