Evaporation control using coating
US7351348B2 · kind B2 · utility
0Cited by
3References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 10, 2005 |
| Grant date | Apr 1, 2008 |
| Priority date | — |
| Expiry date | Aug 10, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A novel arrangement and method for depositing evaporation control agents so as to coat immersion lithographic solutions which are employed on the surface of semiconductor wafers in connection with the etching of the surfaces of the wafer through the intermediary of an immersion lithographic process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.