Lithographic apparatus and device manufacturing method
US7352435B2 · kind B2 · utility
17Cited by
22References
22Claims
0Family size
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Key dates
| Filing date | Oct 15, 2004 |
| Grant date | Apr 1, 2008 |
| Priority date | — |
| Expiry date | Oct 15, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70333
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.