Method for process optimization and control by comparison between 2 or more measured scatterometry signals
US7352453B2 · kind B2 · utility
37Cited by
28References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 17, 2004 |
| Grant date | Apr 1, 2008 |
| Priority date | — |
| Expiry date | May 21, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for determining one or more process parameter settings of a photolithographic system is disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.