Patent · US Active

Systems and methods for cleaning a chamber window of an EUV light source

US7355191B2 · kind B2 · utility

12Cited by
139References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 28, 2005
Grant dateApr 8, 2008
Priority date—
Expiry dateAug 17, 2026

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG21K2201/067
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation. For the system, a subsystem may be positioned outside the chamber and may be operable to pass energy through the window to heat debris accumulating on the inside surface of the window. In a first embodiment, the subsystem may place a flowing, heated gas in contact with the outside surface of the window. In another embodiment, electromagnetic radiation may be passed through the window.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.