William Marx
5Patents
4h-index
15Co-inventors
50Inventor score
Filing activity: Nov 1, 2004 → Aug 2, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7196342B2 | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source | Physics | 260 | Expired |
| US7355191B2 | Systems and methods for cleaning a chamber window of an EUV light source | Physics | 12 | Active |
| US7732793B2 | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source | Physics | 8 | Active |
| US8075732B2 | EUV collector debris management | Performing Operations; Transporting | 7 | Expired |
| US12033268B2 | Volumetric dynamic depth delineation | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.